Description
Titanium Nitride (TiN) Nanopowder/Nanoparticles, Purity: 99.5+%, Size: 20 nm, Cubic
Titanium Nitride (TiN) Nanopowder/Nanoparticles is a high-purity, nanostructured material known for its exceptional hardness, chemical stability at high temperatures, and remarkable thermal conductivity. Produced via the plasma arc vapor phase method, these TiN nanoparticles exhibit a cubic crystal structure with a fine particle size of ~20 nm and a high specific surface area ranging from 50 to 80 m²/g.
Technical Properties:
Property | Value |
---|---|
Purity (%) | 99.5+ |
Color | Black |
Average Particle Size | 20 nm |
Specific Surface Area | 50–80 m²/g |
Bulk Density | 0.08 g/cm³ |
True Density | 5.3 g/cm³ |
Melting Point | 2950 °C |
Crystal Phase | Cubic |
Zeta Potential | -17.50 mV |
Manufacturing Method | Plasma Arc Vapor Phase |
Elemental Composition:
Element | Ti | N | C | Fe |
---|---|---|---|---|
wt% | 77.8 | 21.90 | 0.0002 | 0.0015 |
Applications:
Titanium Nitride (TiN) nanoparticles find widespread use across multiple high-performance fields due to their outstanding mechanical and electrical properties:
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Cutting Tools & Coatings: TiN nanoparticles are employed to improve the wear resistance and hardness of cutting tools, nozzles, and plastic molds. Their high-temperature durability and anti-corrosion properties make them suitable for extreme manufacturing environments.
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Biomedical Field: TiN coatings are biocompatible and used in prosthetic devices and artificial limbs, providing improved longevity and surface stability.
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Microelectronics: TiN serves as a barrier layer in contact and interconnect metallization in semiconductor devices. It is used as a gate electrode in MOS (metal-oxide semiconductor) transistors and in the fabrication of low-barrier Schottky diodes.
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Thin Film & Decorative Coatings: Owing to their golden color and durability, TiN nanoparticles are used in thin films for optical applications and decorative protective coatings.