Hafnium Oxide (HfO2) Micron Powder, Purity: 99.5+%, Size: 1 µm

Description

Hafnium Oxide (HfO₂) Micron Powder, Purity: 99.5+%, Size: 1 µm

Product Description:
Hafnium Oxide (HfO₂) Micron Powder is a highly stable, white crystalline ceramic material with exceptional dielectric properties, high melting point, and strong chemical resistance. This fine powder, with a particle size of 1 micron and purity above 99.5%, is widely utilized in cutting-edge electronic, optical, and thermal applications. As a high-k dielectric material, it enables enhanced performance in semiconductor devices like MOSFETs, allowing further miniaturization without electrical leakage. In optics, its high refractive index and thermal durability make it ideal for laser coatings, lenses, and multilayer mirrors.

Additionally, Hafnium Oxide is used in thermal barrier coatings for aerospace and industrial turbines due to its heat and oxidation resistance. In nuclear engineering, it is valued for its low neutron absorption cross-section, making it suitable for reactor components and shielding. Its applications further extend to capacitors, sensors, memory storage devices, and protective ceramic coatings. Free from toxic, radioactive, or carcinogenic content, HfO₂ is safe for advanced manufacturing environments when handled properly.

Technical Properties:

• Purity: 99.5+ %

• Size: 1 µm

• CAS Number: 12055-23-1

• Molecular Formula: HfO₂

• Molecular Weight: 210.49 g/mol

• Density: 9.68 g/cm³

• Melting Point: ~2758 °C

• Boiling Point: ~5400 °C

• Crystal Structure: Monoclinic

• Form: Fine white powder

Applications:

• High-k dielectric material for microelectronics (MOSFETs, capacitors)

• Optical coatings for lasers, lenses, and filters

• Thermal barrier coatings in aerospace and turbine technologies

• Neutron-absorbing and shielding materials in nuclear reactors

• Ferroelectric memory, sensors, and ceramic protective layers