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Description
Hafnium Oxide (HfO₂) Micron Powder, Purity: 99.99%, Size: -325 mesh
Hafnium Oxide (HfO₂) Micron Powder is a high-purity advanced ceramic material widely used in electronics, optoelectronics, and specialty coatings. With a particle size of -325 mesh and 99.99% purity, HfO₂ offers exceptional thermal stability, high dielectric constant, wide bandgap, and chemical resistance.
Thanks to these properties, hafnium oxide is a key material in semiconductors, transparent optical coatings, high-temperature ceramics, and nuclear technology. Its ability to withstand extreme environments makes it indispensable in both industrial and research applications.
Technical Properties
| Property | Value |
|---|---|
| Chemical Formula | HfO₂ |
| Purity | 99.99% |
| Particle Size | -325 mesh |
| Appearance | White Powder |
| Density | 9.68 g/cm³ |
| Melting Point | 2758 °C |
| Boiling Point | 5400 °C |
| Electrical Resistivity | 4.5 × 10³ µΩ·cm |
| Crystal Structure | Cubic |
| CAS Number | 12055-23-1 |
| Form | Powder |
Applications
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Semiconductors & Microelectronics: Used as a high-k dielectric material in CMOS transistors, capacitors, and next-generation microchips.
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Optoelectronics: Serves in optical coatings, laser optics, and transparent ceramics due to its wide bandgap and stability.
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Nuclear Industry: Applied as a neutron absorber in nuclear reactors.
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High-Temperature Ceramics: Ideal for thermal barrier coatings and refractory applications.
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Catalysis & Sensors: Used in gas sensors, catalytic converters, and advanced functional coatings.
Additional information
| Gram | 25 g, 100 g, 500 g, 1000 g |
|---|