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CVD Graphene

Graphene monolayers can be created or isolated in various ways; however, the most commonly used method is known as chemical vapor deposition. CVD is involved in the production of high-quality graphene, which is also used for large-scale production. Graphene is a two-dimensional sp2 carbon atom structure. Because of its physical and electrical properties, it has a wide range of applications. Its properties include mechanical flexibility, optical transparency, and damage resistance against radiation. Because of this property, it is considered a suitable candidate to be used in the electronic industry and is also widely used against radiation. 

Brand: Nanographenex SKU: GX01GP0110
Monolayer Graphene on SiO2/Si SubstrateSize: 2" Technical Properties of Graphene Film: Transparency> 95 %Coverage:> 93%Thickness (theoretical)0.340 nmSheet Resistance:500-530 Ohms/sqGrain size6-10 μmTechnical Properties of SiO2/Si Substrate: Size (inch)2''Dry Oxide Thicknes..
£252.00
Brand: Nanographenex SKU: GX01GP0111
Monolayer Graphene on SiO2/Si SubstrateSize: 3", Grain Size: 6-10 μm Technical Properties of Graphene Film: Transparency> 95 %Coverage> 93%Thickness (theoretical)0.340 nmSheet Resistance500-530 Ohms/sqGrain size6-10 μmTechnical Properties of SiO2/Si Substrate: Size (inch)3'..
£303.00
Brand: Nanographenex SKU: GX01GP0112
Monolayer Graphene on SiO2/Si SubstrateSize: 4", Grain Size: 6-10 μmTechnical Properties of Graphene Film: Transparency> 95 %Coverage> 93%Thickness (theoretical)0.340 nmSheet Resistance500-530 Ohms/sqGrain Size6-10 μmTechnical Properties of SiO2/Si Substrate: Size (inch)4''..
£395.00
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